scratch & dig 40/20~10/5 flatness λ/4~λ/8 parallelism 10 sec coating ar coating at the end and metal electrode on the z surfaces ln 和 (mgo)ln 是一种重要的调光调制晶体,属三方晶系,负双折射晶体;
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scratch & dig 40/20~10/5 flatness λ/4~λ/8 parallelism 10 sec coating ar coating at the end and metal electrode on the z surfaces ln 和 (mgo)ln 是一种重要的调光调制晶体,属三方晶系,负双折射晶体;
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